Vacuum Plasma/Low-Pressure Plasma Spray

Available from Plasma Processes

Product Details

Vacuum Plasma/Low-Pressure Plasma Spray (Click to enlarge image) Vacuum Plasma Spray (also referred to as Low-Pressure Plasma Spray) combines all the advantages of plasma spray within an inert environment to produce very dense coatings with the lowest oxide content. Vacuum Plasma Spray is cost effective for the spray forming of specialized materials, refractory metals and reactive materials (e.g. titanium). Vacuum Plasma Spray offers the following advantages over conventional atmospheric plasma process:

- Broader and longer spray jets
- Cleaner interfaces through reverse transfer arc sputter cleaning
- Oxide-free coatings
- High coating densities (close to theoretical)
- Low residual stresses
- Increased deposition thickness capability (>25mm or 1 inch)
- High substrate/deposit preheating capability

Applications:
- Planar and cylindrical sputter targets
- Thermal Barrier Coatings
- Medical Device and Implant Coatings
- Refractory Metals
- Dense Ceramics
- Superalloys
- Rocket Nozzles

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