Sputtering Target

Sputtering Target

Shield kits, deposition rings and sputtering targets are crucial in the operation of any PVD operation. During the deposition of some refractory metals, material can build up on the walls of the chambers and shields, which then begins to flake off at a certain thickness. The results are short operating times and high defect rates. APS Materials' twin-wire arc coatings provide the solution! These rough coatings provide 2-5 times the surface area versus an uncoated surface, as well as a very high bond strength to the substrate (4000-7000 psi), which allows the sputtered refractory metals to build up to much higher thicknesses without flaking. The benefits are dramatically increased tool uptime, decreased particle generation and overall lower cost of tool ownership.